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HPHS SciTech Fest
Monday, November 18, 2024
Join us for the 18th Annual Highland Park High School SciTech Fest on Monday, November 18, 2024. Select the speaker presentation(s) you would like to attend during your regularly scheduled science and technology classes. We know you will be encouraged and inspired in the fields of science and technology!
EC116 clear filter
Monday, November 18
 

9:06am CST

2nd Period -
Monday November 18, 2024 9:06am - 9:59am CST
Monday November 18, 2024 9:06am - 9:59am CST
EC116

10:05am CST

3rd Period - High Technology Computing and What Made it Possible
Monday November 18, 2024 10:05am - 10:55am CST
High Technology Computing and What Made it Possible
Speakers
avatar for Michael (Mike) George Sr

Michael (Mike) George Sr

Retired CEO of George Group, Author
Mike received a B.A. in Physics from the University of California, and an M.S. in Physics from the University of Illinois.  Mike left Grad school and joined Texas Instruments in Dallas as an engineer on the Minuteman II D37B Guidance program.  This USAF program was the first mass... Read More →
Monday November 18, 2024 10:05am - 10:55am CST
EC116

11:01am CST

4th Period -
Monday November 18, 2024 11:01am - 11:51am CST
Monday November 18, 2024 11:01am - 11:51am CST
EC116

11:57am CST

5th Period - Extending Moore's Law
Monday November 18, 2024 11:57am - 12:47pm CST
 in 1965 Gordon Moore noticed an exponential trend in semiconductor manufacturing, every year (or so), the number of transistors (~60 at the time) on a chip doubled. He suggested that this might go on for 10 years. Almost 60 years later, there are tens of billions of transistors on a chip, but some indication that the main driver of this self-fulfilling prophesy, the ability of patterning (photolithography) tools to shrink the size of transistors may have come to an end, along with the ability of the mask writing tools (E-Beam Lithography) to make smaller patterns on the masks. This talk will explain how Texas (where semiconductor Integrated Circuits and photolithography were invented in the first place) will extend Moore's Law by at least 20 years. A new patterning tool (NOT photolithography) has been invented in Austin and a new mask writing tool is being developed here in the Dallas area that will write the nanopatterned mask required by this new printing process to make features down to 2nm. 
Speakers
avatar for John N. Randall

John N. Randall

CEO, Zyvex Labs
John N. Randall, CEO of Zyvex Labs, Executive VP of Teliatry, Executive VP at NanoRetina, Adjunct Professor at UT Dallas, and Fellow of the AVS, IEEE, and Micro Nano Engineering Society, has 40 years of experience in Micro- and Nano- Fabrication. He has attracted over $48M in research... Read More →
Monday November 18, 2024 11:57am - 12:47pm CST
EC116

12:53pm CST

6th Period - Extending Moore's Law
Monday November 18, 2024 12:53pm - 1:43pm CST
In 1965 Gordon Moore noticed an exponential trend in semiconductor manufacturing, every year (or so), the number of transistors (~60 at the time) on a chip doubled. He suggested that this might go on for 10 years. Almost 60 years later, there are tens of billions of transistors on a chip, but some indication that the main driver of this self-fulfilling prophesy, the ability of patterning (photolithography) tools to shrink the size of transistors may have come to an end, along with the ability of the mask writing tools (E-Beam Lithography) to make smaller patterns on the masks. This talk will explain how Texas (where semiconductor Integrated Circuits and photolithography were invented in the first place) will extend Moore's Law by at least 20 years. A new patterning tool (NOT photolithography) has been invented in Austin and a new mask writing tool is being developed here in the Dallas area that will write the nanopatterned mask required by this new printing process to make features down to 2nm. 
Speakers
avatar for John N. Randall

John N. Randall

CEO, Zyvex Labs
John N. Randall, CEO of Zyvex Labs, Executive VP of Teliatry, Executive VP at NanoRetina, Adjunct Professor at UT Dallas, and Fellow of the AVS, IEEE, and Micro Nano Engineering Society, has 40 years of experience in Micro- and Nano- Fabrication. He has attracted over $48M in research... Read More →
Monday November 18, 2024 12:53pm - 1:43pm CST
EC116

1:49pm CST

7th Period - Extending Moore's Law
Monday November 18, 2024 1:49pm - 2:39pm CST
In 1965 Gordon Moore noticed an exponential trend in semiconductor manufacturing, every year (or so), the number of transistors (~60 at the time) on a chip doubled. He suggested that this might go on for 10 years. Almost 60 years later, there are tens of billions of transistors on a chip, but some indication that the main driver of this self-fulfilling prophesy, the ability of patterning (photolithography) tools to shrink the size of transistors may have come to an end, along with the ability of the mask writing tools (E-Beam Lithography) to make smaller patterns on the masks. This talk will explain how Texas (where semiconductor Integrated Circuits and photolithography were invented in the first place) will extend Moore's Law by at least 20 years. A new patterning tool (NOT photolithography) has been invented in Austin and a new mask writing tool is being developed here in the Dallas area that will write the nanopatterned mask required by this new printing process to make features down to 2nm. 
Speakers
avatar for John N. Randall

John N. Randall

CEO, Zyvex Labs
John N. Randall, CEO of Zyvex Labs, Executive VP of Teliatry, Executive VP at NanoRetina, Adjunct Professor at UT Dallas, and Fellow of the AVS, IEEE, and Micro Nano Engineering Society, has 40 years of experience in Micro- and Nano- Fabrication. He has attracted over $48M in research... Read More →
Monday November 18, 2024 1:49pm - 2:39pm CST
EC116

2:45pm CST

8th Period - Extending Moore's Law
Monday November 18, 2024 2:45pm - 3:35pm CST
In 1965 Gordon Moore noticed an exponential trend in semiconductor manufacturing, every year (or so), the number of transistors (~60 at the time) on a chip doubled. He suggested that this might go on for 10 years. Almost 60 years later, there are tens of billions of transistors on a chip, but some indication that the main driver of this self-fulfilling prophesy, the ability of patterning (photolithography) tools to shrink the size of transistors may have come to an end, along with the ability of the mask writing tools (E-Beam Lithography) to make smaller patterns on the masks. This talk will explain how Texas (where semiconductor Integrated Circuits and photolithography were invented in the first place) will extend Moore's Law by at least 20 years. A new patterning tool (NOT photolithography) has been invented in Austin and a new mask writing tool is being developed here in the Dallas area that will write the nanopatterned mask required by this new printing process to make features down to 2nm. 
Speakers
avatar for John N. Randall

John N. Randall

CEO, Zyvex Labs
John N. Randall, CEO of Zyvex Labs, Executive VP of Teliatry, Executive VP at NanoRetina, Adjunct Professor at UT Dallas, and Fellow of the AVS, IEEE, and Micro Nano Engineering Society, has 40 years of experience in Micro- and Nano- Fabrication. He has attracted over $48M in research... Read More →
Monday November 18, 2024 2:45pm - 3:35pm CST
EC116
 
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